Global Thin Film Metrology Market 2016 World Analysis and Forecast to 2021

Thin film metrology systems are used to measure the film thickness accurately. A series of film layers that act as a conductors, semiconductors, or bare wafers are deposited on an IC during IC fabrication. Thin film metrology systems are required during thin film deposition process to monitor and measure thin film parameters such as thickness, resistivity, and stress. There are various technologies used to measure the film thickness which include profilometry, ellipsometry, spectroscopic reflectrometry, and X-ray analysis.


This report covers the present scenario and growth prospects of the Global Thin Film Metrology Systems market for the period 2015-2019. It considers 2014 as the base year and provides data for the trailing 12 months. To calculate the market size, the report considers revenue generated from the sales of thin film metrology systems to various end-users including:
• ODMs
• OEMs
• Foundries
Key Regions
• Americas
• APAC
• EMEA.


01. Executive Summary
02. List of Abbreviations
03. Scope of the Report
    03.1 Market Overview
    03.2 Product Offerings
04. Market Research Methodology
    04.1 Market Research Process
    04.2 Research Methodology
05. Introduction
06. Market Landscape
    06.1 Market Size and Forecast
    06.2 Five Forces Analysis
07. Geographical Segmentation
    07.1 Global Thin Film Metrology Systems Market by Geography
08. Buying Criteria
09. Market Growth Drivers
10. Drivers and their Impact
11. Market Challenges
12. Impact of Drivers and Challenges
13. Market Trends
14. Trends and their Impact
15. Vendor Landscape
    15.1 Competitive Scenario
    15.2 Market Share Analysis 2013
    15.3 Other Prominent Vendors
      15.3.1 SCREEN Holdings
      15.3.2 Semilab
      15.3.3 Hitachi High-Technologies  
      

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